Loading...
Please wait, while we are loading the content...
Similar Documents
Electroless Copper Plating Solution
| Content Provider | The Lens |
|---|---|
| Abstract | The invention relates to an electroless aqueous copper plating solution, comprising: a source of copper ions, a reducing agent or a source of a reducing agent, and a combination of complexing agents comprising i) polyamino disuccinic acid, polyamino monosuccinic acid, or a combination thereof, and ii) one or more of ethylenediamine tetraacetic acid, N′-(2-Hydroxyethyl)-ethylenediamine-N,N,N′-triacetic acid, and N,N,N′,N′-Tetrakis (2-hydroxypropyl)ethylenediamine, as well as methods for electroless copper plating utilizing the solution and uses of the solution for the plating of various substrates. |
| Related Links | https://www.lens.org/lens/patent/012-155-759-813-325/frontpage |
| Language | English |
| Publisher Date | 2017-05-16 |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Patent |
| Jurisdiction | United States of America |
| Date Applied | 2014-03-25 |
| Agent | Hunton & Williams Llp |
| Applicant | Atotech Deutschland Gmbh |
| Application No. | 201414779866 |
| Claim | An electroless aqueous copper plating solution comprising: a source of copper ions; a reducing agent or a source of a reducing agent; and a combination of complexing agents, the combination comprising: i) polyamino disuccinic acid, polyamino monosuccinic acid, or combinations thereof, and ii) one or more of a compound which is selected from the group consisting of ethylenediamine tetraacetic acid, N′-(2-Hydroxyethyl)-ethylenediamine-N,N,N′-triacetic acid, and N,N,N′,N′-Tetrakis (2-hydroxypropyl)ethylenediamine. The electroless aqueous copper plating solution according to claim 1 , wherein the combination of complexing agents comprises: N′-(2-Hydroxyethyl)-ethylenediamine-N,N,N′-triacetic acid and N,N,N′,N′-Tetrakis (2-hydroxypropyl)ethylenediamine. The electroless aqueous copper plating solution according to claim 1 , wherein the combination of complexing agents comprises polyamino disuccinic acid. The electroless aqueous copper plating solution according to claim 1 , wherein the combination of complexing agents comprises ethylenediaminedisuccinic acid. The electroless aqueous copper plating solution according to claim 1 , wherein the molar ratio of the combination of complexing agents to copper ions is in the range of 1:1 to 10:1. The electroless aqueous copper plating solution according to claim 1 , wherein the reducing agent is one or more of glyoxylic acid and formaldehyde. The electroless aqueous copper plating solution according to claim 1 , wherein the solution further comprises a stabilizing agent. The electroless aqueous copper plating solution according to claim 7 , wherein the stabilizing agent is a dipyridyl, phenanthroline, mercapto-benzothiazole, thio-urea or derivative, cyanide, thiocyanate, iodide, ethanolamine, or a polymer. The electroless aqueous copper plating solution according to claim 1 , wherein the solution further comprises a source of hydroxide ions. A method for electroless copper plating, the method comprising contacting a substrate with an electroless copper plating solution according to claim 1 . The method according to claim 10 , wherein the substrate is made from glass, ceramic or plastics. The method according to claim 10 , wherein the substrate is glass. The method according to claim 10 , wherein a copper layer having a roughness of 5-40 nm, expressed as root-mean-square roughness parameter (RMS), is formed on the substrate. A method of plating a printed circuit board, integrated circuit substrate, wafer, molded interconnect device, display, display component or plastic part comprising contacting the printed circuit boards, integrated circuit substrates, wafers, molded interconnect devices, displays, display components or plastic parts with the electroless copper plating solution according to claim 1 . A method of plating a glass substrate comprising contacting the glass substrates with the electroless copper plating solution according to claim 1 . The method according to claim 10 , wherein the substrate has a surface area of at least 1 m 2 . The method according to claim 12 , wherein the substrate is a glass pane The method according to claim 15 , wherein the glass substrate is a glass panel for display. The electroless aqueous copper plating solution according to claim 8 , wherein the polymer is a polyacrylamide, polyacrylate, polyethylene glycol, polypropylene glycol, or co-polymer of any of the foregoing. |
| CPC Classification | COATING METALLIC MATERIAL;COATING MATERIAL WITH METALLIC MATERIAL;SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE; BY CHEMICAL CONVERSION OR SUBSTITUTION;COATING BY VACUUM EVAPORATION; BY SPUTTERING; BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION; IN GENERAL Semiconductor Devices Not Covered By Class H10 |
| Examiner | Helene Klemanski |
| Extended Family | 095-289-078-490-107 164-834-290-354-032 180-694-268-105-29X 084-064-336-863-02X 175-464-994-980-991 194-826-956-295-269 013-510-031-063-891 039-065-919-511-635 012-155-759-813-325 165-662-657-029-788 016-417-469-719-595 094-636-584-210-70X 126-461-548-063-48X |
| Patent ID | 9650718 |
| Inventor/Author | Brüning Frank Langhammer Elisa Merschky Michael Lowinski Christian Schulze Jörg Etzkorn Johannes Beck Birgit |
| IPC | C23C18/40 C23C18/16 H01L21/768 H01L23/532 |
| Status | Inactive |
| Owner | Atotech Deutschland Gmbh |
| Simple Family | 095-289-078-490-107 164-834-290-354-032 180-694-268-105-29X 084-064-336-863-02X 175-464-994-980-991 194-826-956-295-269 013-510-031-063-891 039-065-919-511-635 012-155-759-813-325 165-662-657-029-788 016-417-469-719-595 094-636-584-210-70X 126-461-548-063-48X |
| CPC (with Group) | C23C18/40 C23C18/405 H01L2924/0002 C23C18/1639 H01L21/76879 H01L23/53228 |
| Issuing Authority | United States Patent and Trademark Office (USPTO) |
| Kind | Patent/New European patent specification (amended specification after opposition procedure) |
