Film Forming Apparatus and Gas-liquid Separating Apparatus

Content Provider	The Lens
Abstract	A film forming apparatus according to an embodiment includes a reaction chamber; a first pipe having first end portion and second end portion, the first end portion being connected to the reaction chamber, the first pipe extending in a first direction, and having a first opening area in cross-section perpendicular to the first direction; a second pipe disposed such that the first pipe is provided between the reaction chamber and the second pipe, the second pipe having third end portion and fourth end portion, and the second pipe extending in a second direction different from the first direction; a narrow portion provided in the first pipe and having a second opening area smaller than the first opening area in cross-section perpendicular to the first direction; and a liquid storage portion located on an imaginary straight line extending from a center of the second end portion in the first direction.
Related Links	https://www.lens.org/lens/patent/009-456-017-757-556/frontpage
Language	English
Publisher Date	2019-09-26
Access Restriction	Open
Content Type	Text
Resource Type	Patent
Jurisdiction	United States of America
Date Applied	2018-08-23
Applicant	Toshiba Kk Toshiba Electronic Devices & Storage Corp
Application No.	201816110184
Claim	A film forming apparatus comprising: a reaction chamber; a first pipe having first end portion and second end portion, the first end portion being connected to the reaction chamber, the first pipe extending in a first direction in the vicinity of the second end portion, and having a first opening area in cross-section perpendicular to the first direction; a second pipe disposed such that the first pipe is provided between the reaction chamber and the second pipe, the second pipe having third end portion and fourth end portion, the third end portion being on an end closer to the first pipe than the fourth end portion, and the second pipe extending in a second direction different from the first direction in the vicinity of the third end portion; a narrow portion provided in the first pipe and having a second opening area smaller than the first opening area in cross-section perpendicular to the first direction; and a liquid storage portion located on an imaginary straight line extending from a center of the second end portion in the first direction. The film forming apparatus according to claim 1 , further comprising: a pump disposed such that the first pipe and the second pipe are provided between the reaction chamber and the pump, and the pump depressurizing an inner portion of the reaction chamber. The film forming apparatus according to claim 1 , wherein the liquid storage portion is provided between the first pipe and the second pipe. The film forming apparatus according to claim 1 , wherein the liquid storage portion includes a recessed portion. The film forming apparatus according to claim wherein a third opening area of the recessed portion in cross-section perpendicular to the first direction is larger than the second opening area. The film forming apparatus according to claim 1 , wherein the liquid storage portion includes an inclined surface inclined with respect to the first direction and a bank provided on the inclined surface. The film forming apparatus according to claim 1 , further comprising: a storage container located lower than the liquid storage portion in a direction of gravity. The film forming apparatus according to claim 7 , further comprising: a third pipe provided between the liquid storage portion and the storage container. The film forming apparatus according to claim 8 , wherein the third pipe is inclined in the direction of gravity toward the storage container, in an entire region. The film forming apparatus according to claim 8 , wherein the liquid storage portion includes a bending structure to be convex in the direction of gravity. The film forming apparatus according to claim 10 , further comprising: a fourth pipe connecting the second pipe and the third pipe. A gas-liquid separating apparatus comprising: a first pipe having first end portion and second end portion, a mixture of gas and liquid being supplied to the first end portion, the first pipe extending in a first direction in the vicinity of the second end portion, and having a first opening area in cross-section perpendicular to the first direction; a second pipe connected to the first pipe, the second pipe having third end portion and fourth end portion, the third end portion being on an end closer to the first pipe than the fourth end portion, and the second pipe extending in a second direction different from the first direction in the vicinity of the third end portion; a narrow portion provided in the first pipe and having a second opening area smaller than the first opening area in cross-section perpendicular to the first direction; and a liquid storage portion located on an imaginary straight line extending from a center of the second end portion in the first direction. The gas-liquid separating apparatus according to claim 12 , further comprising: a pump disposed such that the second pipe is provided between the first pipe and the pump, and the pump depressurizing the first pipe, the second pipe, and the liquid storage portion. The gas-liquid separating apparatus according to claim 12 , wherein the liquid storage portion is provided between the first pipe and the second pipe. The gas-liquid separating apparatus according to claim 12 , wherein the liquid storage portion includes a recessed portion.
CPC Classification	SINGLE-CRYSTAL GROWTH ;UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL;REFINING BY ZONE-MELTING OF MATERIAL ;PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE ;SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE;AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE ;APPARATUS THEREFOR Separation COATING METALLIC MATERIAL;COATING MATERIAL WITH METALLIC MATERIAL;SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE; BY CHEMICAL CONVERSION OR SUBSTITUTION;COATING BY VACUUM EVAPORATION; BY SPUTTERING; BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION; IN GENERAL
Extended Family	009-456-017-757-556 118-668-801-038-949
Patent ID	20190291040
Inventor/Author	Nakata Rempei Hanyu Hidenori
IPC	B01D47/02 C23C16/24 C23C16/44 C30B25/14 C30B29/06
Status	Discontinued
Owner	Kabushiki Kaisha Toshiba Toshiba Electronic Devices & Storage Corporation
Simple Family	009-456-017-757-556 118-668-801-038-949
CPC (with Group)	C30B29/06 B01D47/024 B01D2221/14 C23C16/24 C23C16/4405 C23C16/4412 C30B25/14
Issuing Authority	United States Patent and Trademark Office (USPTO)
Kind	Patent Application Publication